In this webinar, ATONARP shares in detail how Aston achieves improvements in fab throughput, as well as in-situ metrology solutions for advanced CVD and etch applications. The presentation details Aston's ability to respond to metrology challenges and compare Aston's robust in-situ molecular sensor technology (including an integrated plasma ionization source) with existing legacy metrology solutions. Learn more and access additional resources at http://atonarp.com/aston.
The webinar discussion is led by Saïd Boumsellek, PhD, Sr. Director, Instrumentation & Applications at Atonarp. Saïd holds a PhD in Physics, and has authored over 32 publications in peer-reviewed journals, and 40+ patents in the areas of ionization sources and chemical analysis technologies.
The webinar is hosted by SemiWiki.