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Webinar | Unlocking Molecular Insights

Published on
July 11, 2022
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Optical emission spectroscopy (OES) has been the workhorse in-situ metrology solution in semiconductor FABS for over a decade, but atomic level processes and their new chemistries (ALD and ALE) demand a fresh approach to in-situ metrology, process control and chamber management — with no or weak plasmas these are challenges that OES is unable to address.

Atonarp will discuss its pragmatic approach to these application challenges (through real-life examples of client evaluations) and the unique capabilities in their Aston product portfolio to enable actionable insights to solve these problems.

What you’ll learn:

  • Why are these semiconductor application and process chamber needs emerging now — what’s changed?
  • The Problem statement in applications where a new approach to in-situ process metrology and chamber management is required  
  • What are we solving the problem for clients and what is the value to them?
  • What is different about the Atonarp Aston platform solutions for semiconductor applications?

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